Pulsed-Laser Deposition of Nanostructured Nickel Oxide-Doped Tellurium Oxide Thin Films

Abstract

In this work, tellurium oxide thin films were prepared and doped with nickel oxide at different doping ratios using pulsed-laser deposition technique. The influence of doping level of tellurium oxide films with different amounts of nickel oxide additives (5, 10, 15 and 20%) on the structural characteristics of these films was studied and compared to those of pure tellurium oxide films. The x-ray diffraction patterns showed that all prepared films have polycrystalline structure with tetragonal phase for tellurium oxide and monoclinic phase for nickel oxide with no reaction between them. The surface morphology of the prepared films was analyzed and it revealed the formation of nano-size grains for tellurium oxide films doped with 10 and 15% nickel oxide.