Nanostructured Nickel Oxide Thin Films Prepared by Dual Magnetron DC Reactive Sputtering

Abstract

In this work, nickel oxide nanostructures were prepared by a closed-field unbalanced dual magnetron plasma sputtering technique. The structural characterizations performed on the prepared samples showed that they were polycrystalline and the optimization of preparation conditions, only two crystal planes; (111) and (012), were observed in the final product. The surface roughness of the nanostructures can be varied by controlling the inter-electrode distance. Minimum particle size of 25nm was determined for the samples prepared at inter-electrode distance of 6cm.