Analytical Study on Magnetic Field Distribution of Closed-Field Unbalanced Dual Magnetrons in Plasma Sputtering Systems

Abstract

In this work, the spatial distribution of the magnetic field between two magnetrons in a closed-field unbalanced dual magnetron system was studied. The magnetic field was measured as a function of the position along the circumference of the circular surface of one magnetron. As well, the variation of magnetic field intensity along the vertical distance separating the two magnetrons was determined. A strategy was proposed for the measurement of the variation of magnetic field intensity at 4 cm away from the electrode surface along four axes. The spatial distribution of the magnetic field intensity over the magnetron surface at 4cm was determined and analyzed.