Characterization of Indium Nitride Thin Films Prepared by Plasma-Assisted Molecular Beam Epitaxy. IRAQI JOURNAL OF MATERIALS, [S. l.], v. 3, n. 4, p. 39–44, 2024. DOI: 10.2022/ka5znc18. Disponível em: http://ijmaterials.com/index.php/ijm/article/view/74. Acesso em: 8 sep. 2026.