Characterization of Indium Nitride Thin Films Prepared by Plasma-Assisted Molecular Beam Epitaxy. IRAQI JOURNAL OF MATERIALS, [S. l.], v. 4, n. 1, p. 37–42, 2025. DOI: 10.2022/c18z3512. Disponível em: http://ijmaterials.com/index.php/ijm/article/view/86. Acesso em: 21 oct. 2026.