Analytical Study on Magnetic Field Distribution of Closed-Field Unbalanced Dual Magnetrons in Plasma Sputtering Systems. IRAQI JOURNAL OF MATERIALS, [S. l.], v. 1, n. 2, p. 67–74, 2024. DOI: 10.2022/5d0kc417. Disponível em: https://ijmaterials.com/index.php/ijm/article/view/9. Acesso em: 5 sep. 2026.