Pulsed-Laser Deposition of Nanostructured Nickel Oxide-Doped Tellurium Oxide Thin Films. IRAQI JOURNAL OF MATERIALS, [S. l.], v. 1, n. 3, p. 139–144, 2024. DOI: 10.2022/f8cb3562. Disponível em: https://ijmaterials.com/index.php/ijm/article/view/18. Acesso em: 5 sep. 2026.