Diffusion and Electrical Characteristics of Phosphorous-Doped Silicon Using Excimer Laser Pulses. IRAQI JOURNAL OF MATERIALS, [S. l.], v. 5, n. 2, p. 93–100, 2026. DOI: 10.2022/6jczwf75. Disponível em: https://ijmaterials.com/index.php/ijm/article/view/134. Acesso em: 12 oct. 2026.